Strips of 40 nm width in resist

A. Firsov
Application Center for Microengineering, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, BESSY II, Berlin, Germany
Equipment: SEM LEO 1560, TSL laser interferometer controlled stage

Fragment of outmost zones of Bragg-Fresnel zone plate. Strips of width near 40 nm created in PMMA resist of 50 nm thickness on balk Si substrate.

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