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A part of Bragg-Fresnel zone plate designed for X-ray optics and spectroscopy

A. Firsov
Application Center for Microengineering, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, BESSY II, Berlin, Germany
Equipment: SEM LEO 1560, TSL laser interferometer controlled stage

A part of Bragg-Fresnel zone plate designed for X-ray optics and spectroscopy. Pattern in PMMA resist of 50 nm thickness. Outer diameter of lens is 60 microns and outmost zone size is 40 nm. Writing time about 180 sec at 10 pA beam current, 140 uQ/cm2 resist sensitivity and 3.5 usec/per point dwell time.

A part of Bragg-Fresnel zone plate designed for X-ray optics and spectroscopy
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More images from Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, BESSY II
(Click on image for close view)
A part of Bragg-Fresnel zone plate
1. A part of Bragg-Fresnel zone plate
A part of Bragg-Fresnel zone plate designed...
2. A part of Bragg-Fresnel zone plate designed...
A part of Bragg-Fresnel zone plate designed...
3. A part of Bragg-Fresnel zone plate designed...
A part of Bragg-Fresnel zone plate designed...
4. A part of Bragg-Fresnel zone plate designed...
Fragment of the last zones at the monochromator...
5. Fragment of the last zones at the monochromator...
A part of Bragg-Fresnel zone plate designed...
6. A part of Bragg-Fresnel zone plate designed...
Reflection Zone Plates for focusing X-rays
7. Reflection Zone Plates for focusing X-rays
A part of Bragg-Fresnel zone plate designed...
8. A part of Bragg-Fresnel zone plate designed...
System of lenses at the second monochromator...
9. System of lenses at the second monochromator...
Strips of 40 nm width in resist
10. Strips of 40 nm width in resist
A part of Bragg-Fresnel zone plate designed...
11. A part of Bragg-Fresnel zone plate designed...
A part of Bragg-Fresnel zone plate designed...
12. A part of Bragg-Fresnel zone plate designed...
A part of Bragg-Fresnel zone plate designed...
13. A part of Bragg-Fresnel zone plate designed...
Strips of width near 40 nm created in PMMA resist
14. Strips of width near 40 nm created in PMMA resist
                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                                   
 
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