Real fabricated Si₃N₄ photonic crystal sample

J. Kouba
Application Center for Microengineering, Helmholtz-Zentrum Berlin für Materialien und Energie GmbH, BESSY II, Berlin, Germany
Equipment: SEM LEO 1560, TSL laser interferometer controlled stage

Free standing Si₃N₄ photonic crystal membrane with hexagonal lattice of air holes with lattice period 270 nm and membrane thickness 200 nm as used for measurement of the photonic crystal bulk transmission

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