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NanoMaker Overview

NanoMaker is a powerful software/hardware system for SEM/FIB based lithography that is intended for state-of-the-art technology of designing and manufacturing micro and nano electronic devices and objects.

Why NanoMaker?

NanoMaker provides a unique set of tools for nanotechnologies.
  • It is supplied with friendly graphic editor to design hierarchical structures of any size and shape arranged to any level of complexity.
  • Calculates exposure dose values/times considering proximity effect correction for 2D/3D structures.
  • Makes simulation of resist development.
  • Compensates static distortion of e-beam deflecting system.
  • Significantly reduces total exposure time by actively suppressing dynamic delays of e-beam deflection.
  • Allows writing without beam blanking.
  • Seamlessly integrates Monte Carlo calculation to define exposure recommended parameters for multilayered resist-substrate systems.
  • Can be used as diagnostic tool for creation of high-resolution panoramic view of large-scale (centimeters) micro objects.


  1. To convert any scanning electron microscope (SEM) into an e-beam lithograph.
  2. To provide an ultimate resolution of lithography with a certain setup (including industrial lithographs). To achieve this:
    1. make correction for proximity effect during data preparation for lithography
    2. compensate for the distortion and delays of scanning system during exposure and image acquisition
    3. compensate for the system drift at prolonged exposure

  3. To predict results of lithography by simulating.
  4. To ensure adjustment for various configurations of lithographic equipment, for the presence or absence of beam blanking systems, stages, etc.
  5. To create three-dimensional structures in a resist.
  6. To familiarize user with the basic principles of lithography through the intuitive interface, logical sequence of operations and a solid theoretical basis.
What is new?
March, 2016 Our solutions in the field of nanotechnology and OVD production have been presented at the More...
June, 2015 The NanoMaker is exhibited at the 2015 Photonic Festival in Taiwan More...
December, 2014 Our article, dedicated to the design and fabrication of digital rainbow holograms using SEM based e-beam lithography,... More...
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In product:
September, 2017 64-bit beta version of NanoMaker-Editor is published (build 20.09.2017). To try it out, download the installer from the More...
May, 2013 Updated version of the NanoMaker-Editor is available for download in the Download... More...
January, 2012 Updated version of the NanoMaker-Editor is available for download in the Download... More...
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On site:
February, 2016 A few photos of a device for ultrasensitive detection of nonequilibrium noise (noise detector) published in our More...
January, 2015 Updated manual on Basic of NanoMaker-Editor is published in the Download section. More...
October, 2014 A few photos of "deep" X-ray diffraction gratings based on Si (400) crystal were published in our More...
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SEM controlled by NanoMaker
Scanning Electron Microscope controlled by NanoMaker


  • Microelectronics
  • Nanotechnology, nanophysics
  • 3D nano-micro patterning
  • Diffractive optics (synthetic holograms) for visible and X-ray range
  • Digital microscopy

Easily installed on:

  • Focused Ion Beam machines
  • STM/AFM's
We think you'll find our product worth examining. Please feel free to communicate with us if you have any special requirements for your application.
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