What is the resolution limit of the SEM based lithography system using your software and pattern generator?
Resolution limit depends rather on beam size, accelerated voltage and resist thickness/resolution then on NanoMaker system. Typically with ManoMaker a structure with minimal element size near 30-40 nm
can be created in PMMA resist of 50 nm thickness for 25 kV accelerated voltage on balk Si substrate. Ultrahigh resolution (<10 nm) was demonstrated for special resist and small beam diameter (see "Ultra High Resolution" topic in Examples of Use section).