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A list of the questions and answers.


A list of questions and answers.
Note that this information applies to the latest NanoMaker release / development version.


  1. What are the advantages of NanoMaker?
  2. What is the resolution limit of the SEM based lithography system using your software and pattern generator?
  3. What could be the minimum feature size in resist?
  4. What is the NanoMaker writing speed?
  5. What maximum field area can be exposed without moving the stage?
  6. What the accuracy of fields stitching can be achieved when moving the stage in the following cases: using additional markers in each field and without them?
  7. Is there a feedback in stage control system and with what accuracy the coordinates of the stage could be set?
  8. What is an advantage of the NanoMaker at exposure without blanker?
  9. Is the NanoMaker-Workbench required to run the system?

Evaluation, Sales Policy, Warranties

  1. How can we get a copy of the NanoMaker-Workbench software for evaluation? What is required for that?
  2. Can you explain the differences of the EDU version?
  3. For the EDU version, I believe up to 1000 layers is the cut. Can you confirm?
  4. Can I load the NanoMaker software on my PC and the lab Demo SEM? Will some functionality work without the dongle?
  5. Can you provide us with your typical warranty structure for the hardware/software?


  1. What SEMs have you hooked Nanomaker into?
  2. Do you have a procedure on how to hook your system into new SEM?
  3. What information do you need to hook into our SEM for the complete NanoMaker system?
  4. Could the system be activated and deactivated on the SEM easily, because the SEM system needed to be available for both SEM and Lithography?
  5. How to invert video signal on the NanoMaker side?
  6. What are the costs of Stage Control and Beam Current Monitor drivers?
  7. Have you ever installed your system into an FE-SEM and do you have complete documentation on how to hook up?
  8. Is it possible to install the NanoMaker on the same computer which controls the SEM?
  9. How to install dongle driver?
  10. What does the training comprise? What would we need to prepare?


  1. What actually NanoMaker can control?
  2. Which systems of SEM can be controlled by NanoMaker at exposure?
  3. About beam blanker control. When switch to External Scan is not controlled by NanoMaker there could be a problem of uncontrolled overexposure. How to resolve this?

Comparison with Competitors

  1. When you state "High Speed Pattern Generator" in the Features section, is this possible to quantify? Some of your competitors, for example, state, "Pixelrates up to 40 MHz can be realized..."
  2. I was looking at the package of your competitors, they go into a lot of detail regarding circle pattern generation. What is advantage/disadvantage of this strategy from your point of view?

Pattern Design

  1. Off-site pattern design. I would like to be able to design in my office or at home rather then in microscope room. What do I need for that?
  2. What benefits provides your Hierarchical Multilayer Graphical Editor?
  3. What is the advantage of hierarchical structures? How to create hierarchical structure in NanoMaker?
  4. Is there any difference in that what grid size is chosen?

Import / Export of Lithographic Data

  1. How is it possible to export the information on a dose to other formats?
  2. Can you please describe file output format which contains exposure dose information?
  3. I've loaded GDSII file and try on it but don't know where I can see the correction results?
  4. Is it possible to read into the NanoMaker patterns from DXF a file?
  5. Is there any difference in what the grid size is choosen?
  6. Is it possible to create a structure based on picture?

Proximity Correction. Simulation of Development

  1. My structure is very big and contains references to other structures. What is the recommended way to start the proximity correction in this case?
  2. How to start the Proximity Correction procedure?
  3. We are looking for proximity correction software for our 100 kV e-beam lithography system. Could your software be used for proximity correction at 100 kV?

Recommended Parameters, Monte Carlo Calculation

  1. In Recommended Parameters dialog the default setting of beam energy is 25kV, can we change this default setting?
  2. Weve purchased a new E-beam resist which requires lower sensitivity value. How low sensitivity value can I apply (ex. 0.1 or 0.01)?
  3. How to use resist information, which is different from that are listed in Recommended Parameters dialog?
  4. I would assume that the Monte Carlo Simulation would not work unless we purchase the Workbench software?

Exposure, Development

  1. What type of resist used in the application.?
  2. What kinds of substrates can be used in this application?
  3. How to fulfill exposure with stage?

Batch Processing

  1. Could you tell me how to do the batch process in detail?


  1. Can you explain how the NanoMaker aids in growing a carbon tip on Silicon?
  2. Can you tell me how much height you are able to obtain using this method for whisker tips?
  3. Has any work been accomplished with regards to AFM? Also, can you discuss the bridge concept?
  4. Is it possible to use the SEM-based lithography in the mechanical field?
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