What maximum field area can be exposed without moving the stage? What maximum field area can be exposed without moving the stage? It is supposed that the structure element has minimum size of 0.3 micron.
Maximum area of writing without stage movement depends on the characteristics of microscope:
on defocusing at the area bounds (at the big beam deflection anlge)
on the value of astigmatism at the area bounds
and on noise of microscope amplifiers (beam jitter) at various magnifications (in case of JSM-840 when magnification becomes smaller than
100 the noise usually increases tens times).
For example, using LEO-1560 or JSM-840 one can expose structures of minimum size 0.3 microns in the field of 1 mm.