Now NanoMaker can export proximity corrected data to NPGS.
The new option starts with DXF/GDSII data import and after proximity correction
prepares data in RF6 and DC2 files, which can be seamless used for exposure
with NPGS. Recently published in download
section the NanoMaker-Editor
release includes the export to NPGS. NanoMaker-Editor doesn't include
the proximity effect correction, but anybody is invited to send his data
for such correction and get prepared data in NPGS format.
As a result of processing for proximity effect correction the initial lithographic
structure is fractured into a considerable quantity of elements with a various
dose. Of course, it would be quite borrowing to assign all the doses manually
using NPGS only. Now, with NanoMaker's export procedure prepared data can
be successfully transformed in format suitable for exposure with NPGS (see
scheme in Fig. 1)
The export procedure allows to select one named structure from GDB file
(or GDDII, DXF, ELM files), which will be transferred to DC2 and RF6 files.
The procedure exports not the whole structure but only elements within selected
layers. All hierarchical elements in the named structure are decomposed
up to basic elements (Area, Lines and Points). The elements are grouped
according to Dwell Time and a couple Layer number + Color
number is assigned to each group, regardless of original layers. Then,
the elements are transferred to DC2 format file (with extension *.dc2) and
simultaneously Run File (RF6) is formed and necessary information (like
Area Dose, Line Dose, Point Dose, Origin
Offset, Magnification, Center-to-Center, Line
Spacing, Aperture Number, Measured Beam Current,
…) is added together with links to and attributes of each DC2 file.
Due to difference in lithographic data arrangement the export from NanoMaker
to NPGS is a bit more difficult in comparison to export to GDSII or AutoCAD
formats. Before starting the data export one need to define parameters of
exposure process like exposure steps and dwell times, by setting relevant
process parameters via Recommended Parameters dialogue
(see Fig. 2).
After starting the export procedure a dialogue window Export to DC2
and RF6 Format Files appears (see Fig. 3).
To continue export procedure necessary structures and layers should be selected from the whole structure and then only values of Magnification and known constant Mag. Scale should be defined.
Continuation of the export procedure will produce DC2 and RF6 result files in designated directory.
Fig. 2 The Recommended Parameters dialogue is used
for setting of process relevant parameters like beam size, accelerating
voltage, resist and substrate type, resist thickness, beam current
and resist sensitivity