Fabrication of rainbow hologram with NanoMaker  Fabrication of Rainbow Hologram with NanoMaker
 NanoMaker  Download  Examples of Use  Support  White Papers  Contacts 
English      Russian
 Examples of Use
 Considerations about SEM
 Installation Requirements
 White Papers
Site search by Google
Рейтинг@Mail.ru  eXTReMe Tracker
Q&A item.

Q&A item

Q&A: Exposure, Development

Q: What type of resist used in the application.?
What kinds of photo resist we can use in this application?
A: You can use any resist sensitive to electron irradiation, positive or negative. The most common positive resist PMMA allows to produce structures with a resolution of 40 - 50 nm. For some applications, users may use two resist layers with different properties to achieve better resolution. Typically, your application dictates choice of the resist.
Back to Q&A list
    Copyright © 2002-2017 Interface Ltd. & IMT RAS